Mechanisms of Interface Cleaning in Heterostructures Made from Polymer-Contaminated Graphene


Huang, Z.; Cuniberto, E.; Park, S.; Kisslinger, K.; Wu, Q.; Taniguchi, T.; Watanabe, K.; Yager, K.G.; Shahrjerdi, D. "Mechanisms of Interface Cleaning in Heterostructures Made from Polymer-Contaminated Graphene" Small 2022, 18 2201248.
doi: 10.1002/smll.202201248


We investigate how to generate clean interfaces when stacking layers of 2D materials into heterostructures. Appropriate use of temperature and applied pressure can expunge contaminants.


Heterostructures obtained from layered assembly of 2D materials such as graphene and hexagonal boron nitride have potential in the development of new electronic devices. Whereas various materials techniques can now produce macroscopic scale graphene, the construction of similar size heterostructures with atomically clean interfaces is still unrealized. A primary barrier has been the inability to remove polymeric residues from the interfaces that arise between layers when fabricating heterostructures. Here, the interface cleaning problem of polymer-contaminated heterostructures is experimentally studied from an energy viewpoint. With this approach, it is established that the interface cleaning mechanism involves a combination of thermally activated polymer residue mobilization and their mechanical actuation. This framework allows a systematic approach for fabricating record large-area clean heterostructures from polymer-contaminated graphene. These heterostructures provide state-of-the-art electronic performance. This study opens new strategies for the scalable production of layered materials heterostructures.